TY  - JOUR

T1  - Role of Positive Ions in Determining the Deposition Rate and Film Chemistry of Continuous Wave Hexamethyl Disiloxane Plasmas

JO  - Langmuir

UR  - http://dx.doi.org/10.1021/la202010n

PY  - 2011/09/06

AU  - Michelmore A

AU  - Bryant PM

AU  - Steele DA

AU  - Vasilev K

AU  - Bradley JW

AU  - Short RD

ED  - 

DO  - DOI: 10.1021/la202010n

PB  - American Chemical Society (ACS)

VL  - 27

IS  - 19

SP  - 11943

EP  - 11950

Y2  - 2024/12/22

ER  -