TY  - CONF

T1  - The chemistry of thin film deposits formed from hexamethyldisiloxane and hexamethyldisilazane plasmas

JO  - The Mechanics of Thin Film Coatings

UR  - http://dx.doi.org/10.1142/9789814503914_0031

PY  - 2014/01/14

AU  - Bushnell-Watson SM

AU  - Alexander MR

AU  - Ameen AP

AU  - Rainforth WM

AU  - Short RD

AU  - Jones FR

AU  - Michaeli W

AU  - Stollenwerk M

AU  - Mathar G

AU  - Zabold J

ED  - 

DO  - DOI: 10.1142/9789814503914_0031

PB  - WORLD SCIENTIFIC

Y2  - 2024/12/22

ER  -