@inproceedings{inproceedings, title  = {{A study of processed and unprocessed dual channel Si/SiGe MOSFET device structures using FIB and TEM}},

 url = {{}},

 year = {{2005}},

 month = {{1}},

 author = {{Chang ACK and Norris DJ and Ross IM and Cullis AG and Olsen SH and O'Neill AG}},

 volume = {{107}},

 journal = {{Microscopy of Semiconducting Materials}},

 pages = {{111-114}},

 note = {{Accessed on 2024/12/21}}}