@article{article, title  = {{Low-temperature (≤600 °C) semi-insulating oxygen-doped silicon films by the PECVD technique for large-area power applications}},

 url = {{}},

 year = {{1995}},

 month = {{1}},

 author = {{Clough FJ and Brown AO and Madathil SNE and Milne WI}},

 doi = {{10.1016/0040-6090(95)06834-1}},

 volume = {{270}},

 journal = {{Thin Solid Films}},

 issue = {{1-2}},

 pages = {{517-521}},

 note = {{Accessed on 2024/10/23}}}