@article{article, title  = {{Low-Dimensional Waveguide Grating Fabrication in GaN with Use of SiCl4/Cl-2/Ar-Based Inductively Coupled Plasma Dry Etching}},

 url = {{}},

 year = {{2009}},

 month = {{5}},

 author = {{Dylewicz R and Patela S and Hogg RA and Fry PW and Parbrook PJ and Airey R and Tahraoui A}},

 doi = {{10.1007/s11664-009-0731-5}},

 volume = {{38}},

 journal = {{J ELECTRON MATER}},

 issue = {{5}},

 pages = {{635-639}},

 note = {{Accessed on 2024/12/21}}}