TY  - JOUR

T1  - Investigation of Pt/Ti bilayer metallization on silicon for ferroelectric thin film integration

JO  - Journal of Applied Physics

PY  - 1994/01/01

AU  - Sreenivas K

AU  - Reaney I

AU  - Maeder T

AU  - Setter N

AU  - Jagadish C

AU  - Elliman RG

ED  - 

DO  - DOI: 10.1063/1.355889

VL  - 75

IS  - 1

SP  - 232

EP  - 239

Y2  - 2024/10/23

ER  -