@inbook{inbook, title  = {{Measurements of gate-oxide interface roughness in strained-Si virtual substrate SiGe/Si MOSFET device structures}},

 url = {{}},

 year = {{2018}},

 month = {{1}},

 author = {{Norris DJ and Cullis AG and Olsen SH and O’Neill AG and Zhang J}},

 doi = {{10.1201/9781351074636}},

 isbn = {{9781315895536}},

 pages = {{389-392}},

 note = {{Accessed on 2024/12/20}}}