TY  - CONF

T1  - Multilayered silicon silicon nitride thin films deposited by plasma-CVD: Effects of crystallization

JO  - NANOSTRUCTURED MATERIALS

PY  - 1995/01/01

AU  - Dutta J

AU  - Reaney IM

AU  - Cabarrocas PRI

AU  - Hofmann H

ED  - 

VL  - 6

IS  - 5-8

SP  - 843

EP  - 846

Y2  - 2025/03/13

ER  -