@article{article, title  = {{The impact of non-uniform channel layer growth on device characteristics in state of the Art Si/SiGe/Si p-metal oxide semiconductor field effect transistors}},

 url = {{}},

 year = {{2006}},

 month = {{2}},

 author = {{Chang ACK and Ross IM and Norris DJ and Cullis AG and Tang YT and Cerrina C and Evans AGR}},

 doi = {{10.1016/j.tsf.2005.08.364}},

 volume = {{496}},

 journal = {{THIN SOLID FILMS}},

 issue = {{2}},

 pages = {{306-310}},

 note = {{Accessed on 2024/12/21}}}