@article{article, title  = {{Low temperature (≤ 600°C) semi-insulating oxygen-doped silicon films by the PECVD technique for large area power applications}},

 url = {{}},

 year = {{1995}},

 month = {{1}},

 author = {{Clough FJ and Brown AO and Ekkanath Madathil SN and Milne WI}},

 doi = {{10.1016/0167-9317(95)00095-P}},

 volume = {{28}},

 journal = {{Microelectronic Engineering}},

 issue = {{1-4}},

 pages = {{451-454}},

 note = {{Accessed on 2024/10/23}}}