Electron Beam Lithography
Our Electron Beam Lithography and supporting fabrication facilities include the Raith Voyager electron beam lithography system: a high-resolution and high-throughput instrument capable of patterning sub 10nm features over areas of up to 150mm x 150mm.
Overview
Information about Electron Beam Lithography, our specifications and capabilities, and supporting facilities.
Accessing the facility
The EBL and supporting fabrication facilities are available to researchers across the University.